Gas-phase diagnoses in catalytic chemical vapor deposition (hot-wire CVD) processes
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چکیده
منابع مشابه
Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition
Experiments and numerical simulations have been conducted to determine critical parameters for growth of polycrystalline silicon via hot-wire chemical vapor deposition. Reactor-scale simulations performed using the Direct Simulation Monte Carlo (DSMC) method have revealed a number of important phenomena such as a sharp drop of 1700 K in the gas temperature from the wire to substrate. The gas-ph...
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Hot-wire chemical vapor deposition is a promising technique for deposition of thin amorphous, polycrystalline, and epitaxial silicon films for photovoltaic applications. Fundamental questions remain, however, about the gas-phase and surface-kinetic processes involved. To this end, the nature of the wire decomposition process has been studied in detail by use of mass spectrometry. Atomic silicon...
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2015
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2014.10.014